Patents
8,852,850 (2014) Method of photolithography using a fluid and a system thereof
7,768,648 (2010) Method for aberration evaluation in a projection system
7,345,735 (2008) Apparatus for aberration detection and measurement
7,233,887 (2007) Method of photomask correction and its optimization using localized
frequency analysis
7,170,588 (2007) Reduction Smith-Talbot interferometer prism for micropatterning
7,136,143 (2006) Method for aberration detection and measurement
7,092,073 (2006) Method of illuminating a photomask using chevron illumination
6,934,010 (2005) Optical proximity correction method utilizing gray bars as sub-
resolution assist features (EP1235103, TW243962, KR20020070130,
JP2006079117, JP2002351051)
6,881,523 (2005) Optical proximity correction method utilizing ruled ladder bars as sub-
resolution assist features (EP1241525, TW571571, JP2002357892,
DE60202230)
6,846,595 (2005) Method of improving photomask geometry
6,835,505 (2004) Mask for projection photolithography at or below about 160 nm and a
method thereof
6,791,667 (2004) Illumination device for projection system and method for fabricating
6,788,388 (2004) Illumination device for projection system and method for fabricating
6,556,361 (2003) Projection imaging system with a non-circular aperture and a method
thereof
6,541,750 (2003) Modification of a projection imaging system with a non-circular
aperture and a method thereof
6,525,806 (2003) Apparatus and method of image enhancement through spatial filtering
6,480,263 (2002) Apparatus and method for phase shift photomasking
6,466,304 (2002) Illumination device for projection system and method for fabricating
6,395,433 (2002) Photomask for projection lithography at or below about 160 nm and a
method thereof
6,388,736 (2002) Imaging method using phase boundary masking with modified
illumination (EP1240557, TW509816, JP2003515256, AU1610501)
6,368,755 (2002) Masks for use in optical lithography below 180 nm
6,309,780 (2001) Attenuated phase shift mask and a method for making the mask
5,939,227 (1999) Multi-layered attenuated phase shift mask and a method for making
the mask
Select Publications
Textbooks and Chapters
Nanolithography, M. Feldman ed., Ch. 1: “Optical Lithography”, B.W. Smith, Woodhead Publishing, 2013.
Microlithography: Science and Technology 2nd ed., K. Suzuki and B.W. Smith, ed. , Taylor and Francis, CRC Press: New York, 2007.
“Resist processing,” B.W. Smith, Microlithography: Science and Technology 2nd ed., Ch. 9, K. Suzuki and B.W. Smith, ed. , Taylor and Francis, CRC Press: New York, 2007.
“Multilayer resist technology,” B.W. Smith, Microlithography: Science and Technology 2nd ed., Ch. 10, K. Suzuki and B.W. Smith, ed. , Taylor and Francis, CRC Press: New York, 2007.
“Optics for microlithography,” B.W. Smith, Microlithography: Science and Technology 2nd ed., Ch. 2, K. Suzuki and B.W. Smith, ed. , Taylor and Francis, CRC Press: New York, 2007.
Microlithography:Science and Technology, J. Sheats and B.W. Smith, ed. , Marcel Dekker: New York, 1997.
Optical Microlithography XVIII, B.W. Smith ed., SPIE Press, - Bellingham, WA, 2004, 2005.
Over 150 Published Papers Including:
“Image-based pupil plane characterization via a space-domain basis,” Zac Levinson, Andrew Burbine, Erik Verduijn, Obert Wood, Kenneth A Goldberg, Markus P Benk, Antoine Wojdyla, Bruce W Smith, Journal of Micro/Nanolithography, MEMS, and MOEMS, 16(2) 2017.
“Image-based pupil plane characterization for anamorphic lithography systems,” Zac Levinson, Bruce W Smith, SPIE International Society for Optics and Photonics, Extreme Ultraviolet (EUV) Lithography VIII 10143 (2017).
“Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology,” Zachary Levinson ; Erik Verduijn ; Obert R. Wood ; Pawitter Mangat ; Kenneth A. Goldberg ; Markus P. Benk ; Antoine Wojdyla ; Bruce W. Smith, J. Micro/Nanolith. MEMS MOEMS. 15(2), 023508, 2016.
“Image-based pupil plane characterization via principal component analysis for EUVL tools,” Zac Levinson ; Andrew Burbine ; Erik Verduijn ; Obert Wood ; Pawitter Mangat ; Kenneth A. Goldberg ; Markus P. Benk ; Antoine Wojdyla ; Bruce W. Smith, Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977618, 2016.
“3D mask effects of absorber geometry in EUV lithography systems,” Riaz R. Haque ; Zac Levinson ; Bruce W. Smith, Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760F, 2016.
“An automated image-based tool for pupil plane characterization of EUVL tools,” Zac Levinson ; Jack S. Smith ; Germain Fenger ; Bruce W. Smith, Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97762M, 2016.
“Bayesian inference for OPC modeling,” Andrew Burbine ; John Sturtevant ; David Fryer ; Bruce W. Smith, Proc. SPIE 9780, Optical Microlithography XXIX, 97800I, 2016.
“A method of image-based aberration metrology for EUVL tools,” Zac Levinson ; Sudharshanan Raghunathan ; Erik Verduijn ; Obert Wood ; Pawitter Mangat ; Kenneth Goldberg ; Markus Benk ; Antoine Wojdyla ; Vicky Philipsen ; Eric Hendrickx ; Bruce W. Smith, Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942215, 2015.
“Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images,” Sudharshanan Raghunathan, Obert R Wood, Pawitter Mangat, Erik Verduijn, Vicky Philipsen, Eric Hendrickx, Rik Jonckheere, Kenneth A Goldberg, Markus P Benk, Patrick Kearney, Zachary Levinson, Bruce W Smith, Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 32, 06F801, 2014.
“The saga of sigma: influences of illumination throughout optical generations,” BW Smith - SPIE Advanced Lithography, 2014.
“Optical Projection Lithography,” B.W. Smith, Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems, Woodhead Publishing, 2014.
“Feasibility of compensating for EUV field edge effects through OPC,” C Maloney, J Word, GL Fenger, A Niroomand, BW Smith, SPIE Advanced Lithography, 2014.
“Study of angular effects for optical systems into the EUV,” A Burbine, Z Levinson, A Schepis, BW Smith, SPIE Advanced Lithography, 2014.
“Alternative method for variable aspect ratio vias using a vortex mask,” AR Schepis, Z Levinson, A Burbine, BW Smith - SPIE Advanced Lithography, 2014.
"Extreme ultraviolet lithography resist-based aberration metrology," Germain L. Fenger; Lei Sun; Sudharshanan Raghunathan; Obert R. Wood; Bruce W. Smith, J. Micro/Nanolith. MEMS MOEMS. 12 (4), 2013.
“The Impact of Pupil Plane Filtering on Mask Roughness Transfer,” Burak Baylav, Chris Maloney, Zac Levinson, Joost Bekaert, Alessandro Vaglio Pret, and Bruce W. Smith, J. Vac. Sci. Technol. B 31, 06F801, 2013.
“Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography”, M. K. Sears, B.W. Smith, J. Micro/Nanolith. MEMS MOEMS. 12(1), 2013.
“Scanning interference evanescent wave lithography for sub-22-nm generations,” P. Xie, B. W. Smith, J. Micro/Nanolithography, MEMS, and MOEMS. 12(1), 2013.
“Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography,” M.K. Sears, J. Bekaert, B.W. Smith, Applied Optics 52 (3), 314-322, 2013.
“Line edge roughness (LER) mitigation studies specific to interference-like lithography,: B Baylav, A Estroff, P Xie, BW Smith, Proc. SPIE 8683, Optical Microlithography XXVI, 86831Y, 2013.
“Pupil wavefront manipulation to compensate for mask topography effects in optical nanolithography,” MK Sears, BW Smith, Proc. SPIE 8683, Optical Microlithography XXVI, 86830G, 2013.
“EUVL resist-based aberration metrology,” Germain L. Fenger ; Sudharshanan Raghunathan ; Lei Sun ; Obert R. Wood ; Bruce W. Smith, Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790P, 2013.
“Tuning Metamaterials for Applications at DUV Wavelengths,” A. Estroff, B.W. Smith, Intl. Journal of Optics, 2012.
“Aqueous developable dual switching photoresists for nanolithography”, L. Chen, Y.K. Goh, H.H. Cheng, B.W. Smith, P. Xie, W. Montgomery, A.K. Whittaker, I. Blakey, Journal of Polymer Science Part A: Polymer Chemistry 1, 2012.
“The saga of lambda: spectral influences throughout lithography generations,” B.W. Smith, Proc. SPIE 8325, 2012.
“Pupil wavefront manipulation for optical nanolithography,” Monica Kempsell Sears, Joost Bekaert, and Bruce W. Smith, SPIE 8326, 2012.
“Longer wavelength EUV lithography (LW-EUVL),” Christopher W. Maloney and Bruce W. Smith, Proc. SPIE 8322, 2012.
“Scanning interference evanescent wave lithography for sub-22 nm generations,” Peng Xie and Bruce W. Smith, Proc. SPIE 8326, 2012.
“3D mask modeling for EUV lithography,” Julien Mailfert, Christian Zuniga, Vicky Philipsen, Konstantinos Adam, Michael Lam, James Word, Eric Hendrickx, Geert Vandenberghe, and Bruce Smith, Proc. SPIE 8322, 2012.
“Aqueous Developable Dual Switching Photoresists for Nanolithography,” Lan Chen, Yong Keng Goh, Han Hao Cheng, Bruce W. Smith, Peng Xie, Warren Montgomery, Andrew K. Whittaker, Idriss Blakey, Journal of Polymer Science Part A: Polymer Chemistry, accepted 2012.
“Lithography beyond the IC”, B.W. Smith, Proc. SPIE, v 7973-01, 2011.
“Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193-nm lithography,” M. Krysak, M. Trikeriotis, E. Schwarz, N. lafferty, P. Xie, B.W. Smith, P. Zimmerman, M.W. Montgomery, E. Giannelis, C. Ober, Proc. SPIE v 7972-48, 2011.
“Extending SMO into the pupil plane,” M. Kempsell Sears, B.W. Smith, Proc. SPIE v 7973-46, 2011.
“Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging,” P. Xie and B. W. Smith, J. Vac. Sci. Technol. B 28, 2010.
“Photo-patternable inorganic hardmask,” Alan Telecky, Peng Xie, Jason Stowers, Andrew Grenville, Bruce Smith, and Douglas A. Keszler, J. Vac. Sci. Technol. B 28, 2010.
“Alternatives to Chemical Amplification for 193 nm Lithography,” Baylav, B.; Meng Zhao; Ran Yin; Peng Xie; Scholz, C.; Smith, B.; Smith, T.; Zimmerman, P. Source: Proceedings of the SPIE - The International Society for Optical Engineering, v 7639, 2010.
“Metamaterials for enhancement of DUV lithography,” Estroff, A.; Lafferty, N.V.; Peng Xie; Smith, B.W., Proceedings of the SPIE - The International Society for Optical Engineering, v 7640, 2010.
“Achieving Interferometric Double Patterning through Wafer Rotation,” Peng; Lafferty, N.V.; Smith, B.W. , Proceedings of the SPIE - The International Society for Optical Engineering, v 7640, 2010.
“Development of an inorganic photoresist for DUV, EUV, and electron beam imaging,” Trikeriotis, M.; Woo Jin Bae; Schwartz, E.; Krysak, M.; Lafferty, N.; Peng Xie; Smith, B.; Zimmerman, P.; Ober, C.K.; Giannelis, E.P., Proceedings of the SPIE - The International Society for Optical Engineering, v 7639, 2010.
“Analysis of higher order pitch division for sub-32 nm lithography,” Peng Xie; Smith, B.W. , Proceedings of the SPIE - The International Society for Optical Engineering, v 7274, 2009.
“Alternative optical technologies: more than curiosities?,” Smith, B.W., Proceedings of the SPIE - The International Society for Optical Engineering, v 7274, 2009.
“Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture Kempsell, M.L.; Hendrickx, E.; Tritchkov, A.; Sakajiri, K.; Yasui, K.; Yoshitake, S.; Granik, Yu.; Vandenberghe, G.; Smith, B.W., Journal of Microlithography, Microfabrication, and Microsystems, v 8, n 4, Oct. 2009.
“EUV resist requirements: absorbance and acid yield,” Gronheid, R.; Fonseca, C.; Leeson, M.J.; Adams, J.R.; Strahan, J.R.; Willson, C.G.; Smith, B.W., Proceedings of the SPIE - The International Society for Optical Engineering, v 7273, 2009.
“Design and analysis of a compact EUV IL system,” B.W. Smith, J. Micro/Nanolith. MEMS MOEMS Vol. 8, 021207, 2009.
“Enhancement of hyper-NA imaging through selective TM polarization,” B.W. Smith, J. Zhou, P. Xie, J. Vac. Soc. B: Microelectronics and Nanometer Structures, Volume 26 (6) 2008.
“Photomask image enhancement using grating generated surface waves,” N. Lafferty, A. Estroff, A. Bourov. B.W. Smith, J. Vac. Soc. B: Microelectronics and Nanometer Structures, Volume 26 (6) 2008.
“Applications of TM polarized illumination,” Bruce Smith, Jianming Zhou, and Peng Xie, Proc. SPIE 6924, 2008.
“Quantum state control interference lithography and trim double patterning for 32-16 nm nodes,” Robert D. Frankel, Bruce W. Smith, and Andrew Estroff , Proc. SPIE 6520, 2007.
“Snell or Fresnel: the influence of material index on hyper-NA lithography,” Bruce Smith, Jianming Zhou, Proc. SPIE 6520, 2007.
“Immersion lithography with numerical apertures above 2.0 using high index optical materials, “Jianming Zhou, Neal V. Lafferty, Bruce W. Smith, and John H. Burnett, Proc. SPIE 6520, 2007.
“Mask enhancement using an evanescent wave effect,” Neal V. Lafferty, Jianming Zhou, and Bruce W. Smith, Proc. SPIE 6520, 2007.
“Evanescent wave imaging in optical lithography,” Bruce W Smith, Yongfa Fan, Jianming Zhou, Neal Lafferty, Andrew Estroff, Proc. SPIE Optical Microlithography XIX, 6154, 2006.
“Effects of beam pointing instability on two-beam interferometric lithography,” Yongfa Fan, Anatoly Bourov, Michael Slocum, Bruce W Smith, Proc. SPIE Optical Microlithography XIX, 6154, 2006.
“Resist process window characterization for the 45-nm node using an interferometric immersion microstepper,” Anatoly Bourov, Stewart A Robertson, Bruce W Smith, Michael A Slocum, Emil C Piscani, Proc. SPIE Advances in Resist Technology and Processing XXIII, 6153, 2006.
“Comparison of immersion lithography from projection and interferometric exposure tools,” Stewart A Robertson, Joanne M Leonard, Bruce W Smith, Anatoly Bourov, Proc. Optical Microlithography XIX, 6154, 2006.
“Three-dimensional imaging of 30-nm nanospheres using immersion IL,” Jianming Zhou, Yongfa Fan, Bruce W Smith, Proc. Optical Microlithography XIX, 6154, 2006.
“Experimental measurement of photoresist modulation curves,” Anatoly Bourov, Stewart A Robertson, Bruce W Smith, Michael Slocum, Emil C Piscani, Proc. Optical Microlithography XIX, 6154, 2006.
“Practical approach to full-field wavefront aberration measurement using phase wheel targets,” Lena V Zavyalova, Bruce W Smith, Anatoly Bourov, Gary Zhang, Venugopal Vellanki, Patrick Reynolds, Donis G Flagello, Proc. Optical Microlithography XIX, 6154, 2006.
“High NA 193nm Immersion Lithography for 32nm Half-Pitch Imaging,” J. Zhou, Y. Fan, A. Bourov, B.W. Smith, Appl. Opt., 2006.
“25nm Immersion Lithography at a 193nm Wavelength,” B. W. Smith, Y. Fan, M. Slocum, L. Zavyalova, , Proc. SPIE Optical Microlithography, vol. 5754, 2005.
“Amphibian XIS: An Immersion Lithography Microstepper Platform,” B. W. Smith, A. Bourov, Y. Fan, F. Cropanese, Proc. SPIE Optical Microlithography, vol. 5754, 2005.
“ILSim - A compact simulation tool for interferometric lithography,” Y. Fan, A. Bourov, L. Zavyalova, J. Zhou, A. Estroff, N. Lafferty, B.W. Smith, , Proc. SPIE Optical Microlithography, vol. 5754, 2005.
“Mask-induced polarization effects at high numerical aperture,” A.Estroff, Y.Fan, A.Bourov, and B.W.Smith, J. Microlith. Microfab. Microsyst. Vol. 4, 031107 2005.